|Input Voltage||24 VDC ±10%|
|Balance||Auto balancing system <±20V over time and across the bar length (measured in a controlled environment at 24” distance)|
|Ion Emission||Modulated pulse (MP) technology|
|Emitter Points||Single-crystal silicon emitter points|
|Cleanliness||Meets ISO 14644-12 (0.01 µm particles or nanoparticles) and ISO 14644 Class 1 (0.1 µm particles) using 45-50%|
|Enclosure||ABS chassis (ground plate – carbon filled ABS)|
|Dimension||3.1H x 1.3W x 18/24/34/39/45/51/57/63/69/75/81/87/93L in. (78H x 34W x 450/600/850/1000/1150/1300/1450/1600/1750/1900/2050/2200/2350L mm)|
Simco-Ion’s Model 5635M AeroBar MP ionizing bar is specifically designed to eliminate static charge in semiconductor and other ultra-clean manufacturing processes where fast discharge time, low swing voltages and precision balance are required, but exposed metallic surfaces are not permitted. The Model 5635M utilizes MP technology, combining a high-frequency sine wave with modulated pulses (MP) for high ion output and delivery. This breakthrough technology enables AeroBar mounting within 150 mm of the wafer. MP technology, combined with ultra-clean silicon emitter points and precision adjustment, provides ISO 14644-12 ionization (0.01 µm particles or nanoparticles) and ISO 14644 Class 1 (0.1 µm particles) cleanliness, critical for smaller technology nodes.